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Frictional drag mediated by acoustic phonons

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Frictional drag mediated by acoustic phonons. / Bønsager, M. C.; Flensberg, K.; Hu, B. Y.K.; MacDonald, A. H.

I: Physica B: Condensed Matter, Bind 249-251, 17.06.1998, s. 864-867.

Publikation: Bidrag til tidsskriftTidsskriftartikelForskningfagfællebedømt

Harvard

Bønsager, MC, Flensberg, K, Hu, BYK & MacDonald, AH 1998, 'Frictional drag mediated by acoustic phonons', Physica B: Condensed Matter, bind 249-251, s. 864-867. https://doi.org/10.1016/S0921-4526(98)00332-9

APA

Bønsager, M. C., Flensberg, K., Hu, B. Y. K., & MacDonald, A. H. (1998). Frictional drag mediated by acoustic phonons. Physica B: Condensed Matter, 249-251, 864-867. https://doi.org/10.1016/S0921-4526(98)00332-9

Vancouver

Bønsager MC, Flensberg K, Hu BYK, MacDonald AH. Frictional drag mediated by acoustic phonons. Physica B: Condensed Matter. 1998 jun 17;249-251:864-867. https://doi.org/10.1016/S0921-4526(98)00332-9

Author

Bønsager, M. C. ; Flensberg, K. ; Hu, B. Y.K. ; MacDonald, A. H. / Frictional drag mediated by acoustic phonons. I: Physica B: Condensed Matter. 1998 ; Bind 249-251. s. 864-867.

Bibtex

@article{29df13ef55b3439781129a9d2bdb7a65,
title = "Frictional drag mediated by acoustic phonons",
abstract = "We study phonon-mediated frictional drag between two two-dimensional electron gases. We find two different regimes depending on whether the phonon mean free path ℓph is larger or smaller than a characteristic value ℓph, crit. For ℓph > ℓph, crit, the drag is dominated by coupling through an electron-phonon collective mode, whereas for ℓph < ℓph, crit, the drag is mediated by damped phonons. In the latter case, the drag varies logarithmically with interlayer distance. ℓph, crit depends on the electron densities, and it is therefore possible to experimentally tune a given system between the two regimes.",
keywords = "Double-layer electron systems, Frictional drag, Phonon-mediated interaction",
author = "B{\o}nsager, {M. C.} and K. Flensberg and Hu, {B. Y.K.} and MacDonald, {A. H.}",
year = "1998",
month = "6",
day = "17",
doi = "10.1016/S0921-4526(98)00332-9",
language = "English",
volume = "249-251",
pages = "864--867",
journal = "Physica B: Condensed Matter",
issn = "0921-4526",
publisher = "Elsevier BV * North-Holland",

}

RIS

TY - JOUR

T1 - Frictional drag mediated by acoustic phonons

AU - Bønsager, M. C.

AU - Flensberg, K.

AU - Hu, B. Y.K.

AU - MacDonald, A. H.

PY - 1998/6/17

Y1 - 1998/6/17

N2 - We study phonon-mediated frictional drag between two two-dimensional electron gases. We find two different regimes depending on whether the phonon mean free path ℓph is larger or smaller than a characteristic value ℓph, crit. For ℓph > ℓph, crit, the drag is dominated by coupling through an electron-phonon collective mode, whereas for ℓph < ℓph, crit, the drag is mediated by damped phonons. In the latter case, the drag varies logarithmically with interlayer distance. ℓph, crit depends on the electron densities, and it is therefore possible to experimentally tune a given system between the two regimes.

AB - We study phonon-mediated frictional drag between two two-dimensional electron gases. We find two different regimes depending on whether the phonon mean free path ℓph is larger or smaller than a characteristic value ℓph, crit. For ℓph > ℓph, crit, the drag is dominated by coupling through an electron-phonon collective mode, whereas for ℓph < ℓph, crit, the drag is mediated by damped phonons. In the latter case, the drag varies logarithmically with interlayer distance. ℓph, crit depends on the electron densities, and it is therefore possible to experimentally tune a given system between the two regimes.

KW - Double-layer electron systems

KW - Frictional drag

KW - Phonon-mediated interaction

UR - http://www.scopus.com/inward/record.url?scp=0032093941&partnerID=8YFLogxK

U2 - 10.1016/S0921-4526(98)00332-9

DO - 10.1016/S0921-4526(98)00332-9

M3 - Journal article

AN - SCOPUS:0032093941

VL - 249-251

SP - 864

EP - 867

JO - Physica B: Condensed Matter

JF - Physica B: Condensed Matter

SN - 0921-4526

ER -

ID: 199596256